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Sliders qhia peb kab lus rau ib tus swb.Siv cov nyees khawm rov qab thiab tom ntej kom txav mus los ntawm cov slides, lossis cov khawm tswj swb thaum kawg kom txav mus los ntawm txhua tus swb.
qhia txog electrochemical stratification ntawm non-conducting boron rau hauv nyias txheej borons.Cov txiaj ntsig tshwj xeeb no tau ua tiav los ntawm kev sib koom ua ke bulk boron rau hauv cov hlau mesh uas induces hluav taws xob conduction thiab opens qhov chaw rau boron fabrication nrog no zoo lub tswv yim.Kev sim ua nyob rau hauv ntau yam electrolytes muab cov cuab yeej muaj zog kom tau txais borene flakes ntawm ntau theem nrog lub thickness ntawm ~ 3-6 nm.Lub tshuab ntawm electrochemical tshem tawm ntawm boron kuj qhia thiab sib tham.Yog li, txoj kev npaj tuaj yeem ua lub cuab yeej tshiab rau kev tsim cov txheej txheem loj ntawm cov txheej nyias nyias thiab ua kom muaj kev loj hlob ntawm kev tshawb fawb txog burs thiab lawv cov kev siv tau.
Ob-dimensional (2D) cov ntaub ntawv tau txais ntau qhov kev txaus siab nyob rau hauv xyoo tas los no vim lawv cov khoom tshwj xeeb xws li hluav taws xob conductivity lossis qhov chaw muaj zog.Txoj kev loj hlob ntawm cov ntaub ntawv graphene tau ntxim nyiam rau lwm cov ntaub ntawv 2D, yog li cov ntaub ntawv 2D tshiab tau raug tshawb fawb ntau.Ntxiv rau qhov paub zoo graphene, kev hloov pauv hlau dichalcogenides (TMD) xws li WS21, MoS22, MoSe3, thiab WSe4 kuj tau kawm ntxiv tsis ntev los no.Txawm hais tias cov ntaub ntawv hais los saum toj no, hexagonal boron nitride (hBN), phosphorus dub thiab tsis ntev los no ua tiav boronene.Ntawm lawv, boron nyiam ntau xim raws li ib qho ntawm cov tub ntxhais hluas tshaj plaws ntawm ob sab.Nws yog txheej zoo li graphene tab sis nthuav tawm cov khoom nthuav vim nws cov anisotropy, polymorphism thiab siv lead ua qauv.Bulk boron tshwm raws li lub hauv paus tsev thaiv hauv B12 icosahedron, tab sis ntau hom boron crystals yog tsim los ntawm kev sib koom thiab kev sib txuas hauv B12.Yog li ntawd, boron blocks feem ntau tsis txheej zoo li graphene lossis graphite, uas ua rau nyuaj rau cov txheej txheem kom tau txais boron.Tsis tas li ntawd, ntau cov ntaub ntawv polymorphic ntawm borophene (piv txwv li, α, β, α1, pmmm) ua rau nws nyuaj dua 5.Ntau theem ua tiav thaum lub sij hawm sib txuas ncaj qha cuam tshuam rau cov khoom ntawm harrows.Yog li ntawd, kev txhim kho cov txheej txheem hluavtaws uas ua rau kom tau txais cov theem tshwj xeeb borocenes nrog qhov loj ntawm sab nraud thiab cov tuab me me ntawm flakes tam sim no xav tau kev kawm tob.
Ntau txoj hauv kev rau kev sib txuas 2D cov ntaub ntawv yog raws li cov txheej txheem sonochemical uas cov ntaub ntawv loj tau muab tso rau hauv cov kuab tshuaj, feem ntau yog cov kuab tshuaj organic, thiab sonicated rau ob peb teev.Ranjan et al.6 ntse exfoliated bulk boron rau hauv borophene siv txoj kev piav saum toj no.Lawv tau kawm ntau yam ntawm cov kuab tshuaj organic (methanol, ethanol, isopropanol, acetone, DMF, DMSO) thiab pom tias sonication exfoliation yog ib txoj hauv kev yooj yim kom tau txais cov boron loj thiab nyias.Tsis tas li ntawd, lawv tau pom tias txoj kev hloov kho Hummers kuj tuaj yeem siv los tshem tawm boron.Kua stratification tau pom los ntawm lwm tus: Lin et al.7 siv crystalline boron los ua ib qho chaw los ua ke cov nplooj ntawv qis β12-borene thiab siv ntxiv rau hauv cov roj teeb lithium-sulfur borene, thiab Li li al.8 ua qauv qhia qis-txheej boronene nplooj ntawv..Nws tuaj yeem tau txais los ntawm sonochemical synthesis thiab siv los ua supercapacitor electrode.Txawm li cas los xij, atomic txheej deposition (ALD) kuj yog ib qho ntawm cov hauv qab-up synthesis txoj kev rau boron.Mannix et al.9 tso boron atoms rau ntawm atomically ntshiab nyiaj txhawb.Txoj hauv kev no ua rau nws tuaj yeem tau txais cov nplooj ntawv ntawm ultra-ntshiab boronene, txawm li cas los xij kev sim-scale tsim ntawm boronene raug txwv hnyav vim cov txheej txheem hnyav (ultra-high nqus).Yog li ntawd, nws yog ib qho tseem ceeb los tsim cov tswv yim zoo tshiab rau kev tsim cov boronene, piav qhia txog kev loj hlob / kev sib tw, thiab tom qab ntawd ua qhov tseeb theoretical tsom xam ntawm nws cov khoom, xws li polymorphism, hluav taws xob thiab thermal hloov.H. Liu et al.10 tau tham thiab piav qhia txog cov txheej txheem ntawm boron kev loj hlob ntawm Cu(111) substrates.Nws muab tawm tias boron atoms zoo li tsim 2D tuab pawg raws li cov duab peb sab, thiab tsim lub zog tsis tu ncua nrog cov pawg loj, qhia tias 2D boron pawg ntawm tooj liab substrates tuaj yeem loj hlob mus ib txhis.Ib qho kev soj ntsuam ntxaws ntxiv ntawm cov nplooj ntawv boron ob sab yog nthuav tawm los ntawm D. Li et al.11, qhov twg ntau yam substrates tau piav qhia thiab muaj peev xwm siv tau los tham txog.Nws tau qhia meej tias muaj qee qhov tsis sib xws ntawm kev suav theoretical thiab cov txiaj ntsig kev sim.Yog li ntawd, kev suav theoretical yuav tsum tau nkag siab txog cov khoom thiab cov txheej txheem ntawm kev loj hlob boron.Ib txoj hauv kev kom ua tiav lub hom phiaj no yog siv cov nplaum nplaum yooj yim kom tshem tawm boron, tab sis qhov no tseem tsawg dhau los tshawb xyuas cov khoom siv yooj yim thiab hloov kho nws cov tswv yim thov12.
Ib txoj hauv kev zoo ntawm engineering tev ntawm 2D cov ntaub ntawv los ntawm cov ntaub ntawv loj yog electrochemical tev.Ntawm no ib qho ntawm cov electrodes muaj cov khoom siv ntau.Feem ntau, cov tebchaw uas feem ntau exfoliated los ntawm electrochemical txoj kev yog cov conductive heev.Lawv muaj xws li compressed sticks los yog ntsiav tshuaj.Graphite tuaj yeem ua tiav exfoliated nyob rau hauv txoj kev no vim nws cov hluav taws xob hluav taws xob siab.Achi thiab nws pab neeg 14 tau ua tiav exfoliated graphite los ntawm kev hloov graphite rods rau hauv graphite pressed nyob rau hauv lub xub ntiag ntawm ib daim nyias nyias siv los tiv thaiv decomposition ntawm tej khoom.Lwm cov laminates loj tau ua tiav exfoliated zoo ib yam, piv txwv li, siv Janus15 electrochemical delamination.Ib yam li ntawd, txheej txheej dub phosphorus yog electrochemically stratified, nrog acidic electrolyte ions diffusing rau hauv qhov chaw nruab nrab ntawm cov khaubncaws sab nraud povtseg vim yog siv voltage.Hmoov tsis zoo, tib txoj hauv kev tsis tuaj yeem tsuas yog siv rau stratification ntawm boron rau hauv borophene vim qhov hluav taws xob tsawg ntawm cov khoom siv ntau.Tab sis yuav ua li cas yog tias cov hmoov xoob boron muaj nyob rau hauv cov hlau mesh (nickel-nickel lossis tooj liab-tooj ​​liab) siv los ua electrode?Puas yog nws muaj peev xwm induce lub conductivity ntawm boron, uas yuav ntxiv electrochemically cais raws li ib tug txheej txheej ntawm hluav taws xob conductors?Dab tsi yog theem ntawm cov txheej txheem qis boronene?
Hauv txoj kev tshawb no, peb teb cov lus nug no thiab qhia tau tias qhov yooj yim lub tswv yim no muab ib txoj hauv kev tshiab rau kev tsim cov burs nyias, raws li pom hauv daim duab 1.
Lithium chloride (LiCl, 99.0%, CAS: 7447-41-8) thiab boron hmoov (B, CAS: 7440-42-8) tau yuav los ntawm Sigma Aldrich (USA).Sodium sulfate (Na2SO4, ≥ 99.0%, CAS: 7757-82-6) muab los ntawm Chempur (Poland).Dimethyl sulfoxide (DMSO, CAS: 67-68-5) los ntawm Karpinex (Poland) tau siv.
Atomic force microscopy (AFM MultiMode 8 (Bruker)) muab cov ntaub ntawv ntawm lub thickness thiab lattice loj ntawm cov khoom txheej.Kev daws teeb meem siab kis tau tus mob electron microscopy (HR-TEM) tau ua los ntawm FEI Tecnai F20 microscope ntawm qhov nrawm nrawm ntawm 200 kV.Atomic absorption spectroscopy (AAS) tsom xam tau ua los ntawm Hitachi Zeeman polarized atomic absorption spectrophotometer thiab nplaim nebulizer los txiav txim txog kev tsiv teb tsaws ntawm cov hlau ions mus rau hauv cov tshuaj thaum lub sij hawm electrochemical exfoliation.Lub zeta muaj peev xwm ntawm bulk boron tau ntsuas thiab nqa tawm ntawm Zeta Sizer (ZS Nano ZEN 3600, Malvern) los txiav txim siab qhov muaj peev xwm ntawm cov boron ntau.Cov tshuaj muaj pes tsawg leeg thiab cov txheeb ze atomic feem pua ​​​​ntawm qhov chaw ntawm cov qauv tau kawm los ntawm X-ray photoelectron spectroscopy (XPS).Kev ntsuas tau ua tiav siv Mg Ka hluav taws xob (hν = 1253.6 eV) hauv PREVAC system (Poland) nruab nrog Scienta SES 2002 electron zog analyzer (Sweden) ua haujlwm ntawm lub zog xa mus tas li (Ep = 50 eV).Lub tshuab tsom xam tau khiav tawm mus rau qhov siab hauv qab 5 × 10-9 mbar.
Feem ntau, 0.1 g ntawm dawb-ntws boron hmoov yog thawj zaug nias rau hauv cov hlau mesh disk (nickel lossis tooj liab) siv lub xovxwm hydraulic.Lub disk muaj txoj kab uas hla ntawm 15 mm.Npaj disks yog siv los ua electrodes.Ob hom electrolytes tau siv: (i) 1 M LiCl hauv DMSO thiab (ii) 1 M Na2SO4 hauv dej deionized.Lub platinum hlau tau siv los ua cov khoom siv electrode.Daim duab schematic ntawm lub chaw ua haujlwm tau pom nyob rau hauv daim duab 1. Hauv electrochemical stripping, muab tam sim no (1 A, 0.5 A, lossis 0.1 A) yog siv ntawm cathode thiab anode.Lub sijhawm ntawm txhua qhov kev sim yog 1 teev.Tom qab ntawd, cov supernatant tau sau, centrifuged ntawm 5000 rpm thiab ntxuav ob peb zaug (3-5 zaug) nrog dej deionized.
Ntau yam tsis zoo, xws li lub sijhawm thiab kev ncua deb ntawm electrodes, cuam tshuam rau morphology ntawm cov khoom kawg ntawm electrochemical sib cais.Ntawm no peb tshuaj xyuas qhov cuam tshuam ntawm cov electrolyte, cov ntaub ntawv tam sim no (1 A, 0.5 A thiab 0.1 A; voltage 30 V) thiab hom phiaj hlau (Ni nyob ntawm qhov cuam tshuam loj).Ob qhov sib txawv electrolytes tau sim: (i) 1 M lithium chloride (LiCl) hauv dimethyl sulfoxide (DMSO) thiab (ii) 1 M sodium sulfate (Na2SO4) hauv deionized (DI) dej.Hauv thawj zaug, lithium cations (Li +) yuav cuam tshuam rau hauv boron, uas cuam tshuam nrog cov nqi tsis zoo hauv cov txheej txheem.Nyob rau hauv rooj plaub tom kawg, sulfate anion (SO42-) yuav intercalate rau hauv ib tug zoo them boron.
Thaum xub thawj, qhov kev txiav txim ntawm cov electrolytes saum toj no tau pom ntawm qhov tam sim no ntawm 1 A. Cov txheej txheem siv 1 teev nrog ob hom kab hlau hlau (Ni thiab Cu), feem.Daim duab 2 qhia txog atomic force microscopy (AFM) duab ntawm cov khoom tshwm sim, thiab qhov sib thooj qhov siab yog qhia hauv daim duab S1.Tsis tas li ntawd, qhov siab thiab qhov ntev ntawm cov flakes ua nyob rau hauv txhua qhov kev sim tau pom nyob rau hauv Table 1. Thaj, thaum siv Na2SO4 ua ib qho electrolyte, lub thickness ntawm cov flakes yog tsawg dua thaum siv daim phiaj tooj liab.Piv rau flakes tev tawm nyob rau hauv lub xub ntiag ntawm ib tug nickel cab kuj, lub thickness txo los ntawm li 5 zaug.Interestingly, qhov loj me ntawm cov nplais tau zoo sib xws.Txawm li cas los xij, LiCl / DMSO tau ua haujlwm zoo hauv cov txheej txheem exfoliation siv ob lub hlau meshes, ua rau 5-15 txheej ntawm borocene, zoo ib yam li lwm cov kua exfoliating, ua rau ntau txheej ntawm borocene7,8.Yog li, cov kev tshawb fawb ntxiv yuav nthuav tawm cov qauv ntxaws ntawm cov qauv stratified hauv cov electrolyte no.
AFM cov duab ntawm cov nplooj ntawv borocene tom qab electrochemical delamination rau hauv A Cu_Li+_1 A, B Cu_SO42−_1 A, C Ni_Li+_1 A, and D Ni_SO42−_1 A.
Kev tshuaj xyuas tau ua tiav nrog kev sib kis ntawm electron microscopy (TEM).Raws li pom nyob rau hauv daim duab 3, cov qauv loj ntawm boron yog crystalline, raws li muaj pov thawj los ntawm TEM cov duab ntawm ob qho tib si boron thiab txheej boron, nrog rau cov sib xws Fast Fourier Transform (FFT) thiab tom ntej Xaiv Cheeb Tsam Electron Diffraction (SAED) qauv.Qhov sib txawv tseem ceeb ntawm cov qauv tom qab cov txheej txheem delamination tau yooj yim pom nyob rau hauv cov duab TEM, qhov twg d-spacings yog sharper thiab qhov deb yog luv dua (0.35-0.9 nm; Table S2).Thaum cov qauv tsim ntawm tooj liab mesh sib npaug ntawm β-rhombohedral qauv ntawm boron8, cov qauv tsim siv cov npib tsib xee.meshua tau raws li kev kwv yees kwv yees ntawm lub lattice tsis: β12 thiab χ317.Qhov no tau ua pov thawj tias cov qauv ntawm borocene yog crystalline, tab sis lub thickness thiab crystal qauv hloov thaum exfoliation.Txawm li cas los xij, nws qhia meej txog qhov kev cia siab ntawm daim phiaj siv (Cu lossis Ni) ntawm crystallinity ntawm qhov tshwm sim borene.Rau Cu lossis Ni, nws tuaj yeem yog ib leeg-crystal lossis polycrystalline, feem.Crystal kev hloov kho kuj tau pom nyob rau hauv lwm cov txheej txheem exfoliation18,19.Hauv peb cov ntaub ntawv, cov kauj ruam d thiab cov qauv kawg yog nyob ntawm seb hom kab sib chaws siv (Ni, Cu).Cov kev hloov pauv tseem ceeb tuaj yeem pom hauv SAED cov qauv, qhia tias peb txoj kev ua rau muaj kev tsim cov qauv siv lead ua ntau dua.Tsis tas li ntawd, cov duab kos duab hauv elemental (EDX) thiab STEM imaging tau ua pov thawj tias cov khoom siv 2D fabricated muaj cov khoom boron (Fig. S5).Txawm li cas los xij, kom nkag siab tob dua ntawm cov qauv, cov kev tshawb fawb ntxiv ntawm cov khoom ntawm cov khoom siv dag zog borophene yog xav tau.Tshwj xeeb, kev tsom xam ntawm borene npoo yuav tsum tau txuas ntxiv, raws li lawv ua lub luag haujlwm tseem ceeb hauv kev ruaj ntseg ntawm cov khoom thiab nws cov catalytic kev ua tau zoo20,21,22.
TEM dluab ntawm tej boron A, B Cu_Li+_1 A thiab C Ni_Li+_1 A thiab coj SAED qauv (A', B', C');ceev Fourier hloov pauv (FFT) ntxig rau TEM duab.
X-ray photoelectron spectroscopy (XPS) tau ua los txiav txim siab txog qib oxidation ntawm cov qauv borene.Thaum lub sij hawm cua sov ntawm cov qauv borophene, boron-boron piv tau nce los ntawm 6.97% mus rau 28.13% (Table S3).Lub caij no, qhov txo qis ntawm boron suboxide (BO) daim ntawv cog lus tshwm sim feem ntau vim yog kev sib cais ntawm cov oxides saum npoo thiab kev hloov pauv ntawm boron suboxide rau B2O3, raws li qhia los ntawm kev nce ntawm B2O3 hauv cov qauv.Ntawm daim duab.S8 qhia txog kev hloov pauv hauv kev sib txuas ntawm boron thiab oxide ntsiab lus thaum cua sov.Tag nrho cov spectrum yog qhia nyob rau hauv daim duab.S7.Kev ntsuam xyuas pom tias boronene oxidized rau saum npoo ntawm boron: oxide piv ntawm 1: 1 ua ntej cua sov thiab 1.5: 1 tom qab cua sov.Rau cov lus piav qhia ntxaws ntxiv ntawm XPS, saib Cov Ntaub Ntawv Ntxiv.
Cov kev sim tom ntej no tau ua los ntsuas qhov cuam tshuam ntawm qhov tam sim no siv ntawm cov electrodes thaum sib cais electrochemical.Cov kev ntsuam xyuas tau ua tiav ntawm 0.5 A thiab 0.1 A hauv LiCl / DMSO, feem.Cov txiaj ntsig ntawm AFM cov kev tshawb fawb tau pom nyob rau hauv daim duab 4, thiab qhov sib thooj qhov siab profile tau pom hauv daim duab.S2 thiab S3.Xav txog tias lub thickness ntawm ib tug borophene monolayer yog hais txog 0.4 nm, 12,23 nyob rau hauv kev sim ntawm 0.5 A thiab lub xub ntiag ntawm ib tug tooj liab daim phiaj, lub thinnest flakes sib haum mus rau 5-11 borophene txheej nrog lateral qhov ntev ntawm txog 0.6-2.5 μm.Tsis tas li ntawd, hauv kev sim nrognpib tsib xeedaim phiaj, flakes nrog ib qho me me thickness faib (4.82-5.27 nm) tau txais.Interestingly, boron flakes tau los ntawm cov txheej txheem sonochemical muaj qhov sib xws ntawm flake qhov ntau thiab tsawg ntawm 1.32–2.32 nm7 lossis 1.8–4.7 nm8.Tsis tas li ntawd, electrochemical exfoliation ntawm graphene tau npaj los ntawm Achi li al.14 ua rau cov flakes loj (> 30 µm), uas tej zaum yuav muaj feem xyuam rau qhov loj ntawm cov khoom pib.Txawm li cas los xij, graphene flakes yog 2-7 nm tuab.Flakes ntawm qhov loj thiab qhov siab ntau dua tuaj yeem tau txais los ntawm kev txo cov ntawv thov tam sim no los ntawm 1 A txog 0.1 A. Yog li, tswj qhov kev ntxhib los mos tseem ceeb ntawm cov ntaub ntawv 2D yog ib lub tswv yim yooj yim.Nws yuav tsum raug sau tseg tias qhov kev sim ua tiav ntawm daim phiaj npib tsib xee nrog qhov tam sim no ntawm 0.1 A tsis ua tiav.Qhov no yog vim tsis tshua muaj hluav taws xob conductivity ntawm npib tsib xee piv rau tooj liab thiab lub zog tsis txaus yuav tsum tau tsim borophene24.TEM tsom xam ntawm Cu_Li+_0.5 A, Cu_Li+_0.1 A, Cu_SO42-_1 A, Ni_Li-_0.5 A thiab Ni_SO42-_1 A yog qhia hauv daim duab S3 thiab daim duab S4, feem.
Electrochemical ablation ua raws li AFM duab.(A) Cu_Li+_1A, (B) Cu_Li+_0.5A, (C) Cu_Li+_0.1A, (D) Ni_Li+_1A, (E) Ni_Li+_0.5A.
Ntawm no peb kuj qhia txog ib qho kev ua tau zoo rau kev stratification ntawm ib qho tho rau hauv nyias txheej xyaum (Fig. 5).Thaum pib, cov burr loj tau nias rau hauv Cu / Ni daim phiaj kom induce conduction nyob rau hauv lub electrode, uas ntse siv ib tug voltage ntawm lub auxiliary electrode (Pt hlau) thiab cov ua hauj lwm electrode.Qhov no tso cai rau cov ions tsiv teb tsaws los ntawm cov electrolyte thiab ua rau hauv cov khoom siv cathode / anode, nyob ntawm seb cov electrolyte siv.AAS tsom xam pom tias tsis muaj ions raug tso tawm los ntawm cov hlau mesh thaum lub sijhawm ua haujlwm no (saib Cov Lus Qhia Ntxiv).qhia tau hais tias tsuas yog ions los ntawm electrolyte tuaj yeem nkag mus rau hauv cov qauv boron.Cov khoom lag luam boron feem ntau siv rau hauv cov txheej txheem no feem ntau hu ua "amorphous boron" vim nws qhov kev faib tawm ntawm cov thawj cell units, icosahedral B12, uas yog rhuab mus rau 1000 ° C los tsim ib qho kev txiav txim β-rhombohedral qauv (Fig. S6) 25.Raws li cov ntaub ntawv, lithium cations tau yooj yim nkag mus rau hauv cov qauv boron ntawm thawj theem thiab rhuav tshem cov tawg ntawm B12 roj teeb, nws thiaj li tsim tau ob-seem boronene qauv nrog cov qauv txiav txim siab, xws li β-rhombohedra, β12 lossis χ3. , nyob ntawm qhov siv tam sim no thiab covmeshkhoom.Txhawm rau nthuav tawm qhov kev sib raug zoo Li + rau bulk boron thiab nws lub luag haujlwm tseem ceeb hauv cov txheej txheem delamination, nws lub peev xwm zeta (ZP) tau ntsuas yog -38 ± 3.5 mV (saib Cov Lus Qhia Ntxiv).Qhov tsis zoo ZP tus nqi rau bulk boron qhia tau hais tias kev sib txuas ntawm cov lithium cations zoo dua li lwm cov ions siv hauv txoj kev tshawb no (xws li SO42-).Qhov no kuj piav qhia txog kev nkag mus tau zoo dua ntawm Li + rau hauv cov qauv boron, ua rau muaj txiaj ntsig zoo dua electrochemical tshem tawm.
Yog li, peb tau tsim ib txoj kev tshiab kom tau txais cov txheej txheem qis borons los ntawm electrochemical stratification ntawm boron siv Cu / Ni daim phiaj hauv Li + / DMSO thiab SO42- / H2O cov kev daws teeb meem.Nws kuj zoo li muab cov khoom tso tawm ntawm ntau theem nyob ntawm qhov siv tam sim no thiab daim phiaj siv.Lub tshuab ntawm cov txheej txheem exfoliation kuj tau npaj thiab sib tham.Nws tuaj yeem txiav txim siab tias cov txheej txheem qis boronene tuaj yeem ua tau yooj yim los ntawm kev xaiv cov hlau mesh uas tsim nyog raws li tus neeg nqa khoom boron thiab optimizing cov ntaub ntawv tam sim no, uas tuaj yeem siv ntxiv rau hauv kev tshawb fawb los yog kev siv tswv yim.Qhov tseem ceeb tshaj, qhov no yog thawj qhov kev sim ua tiav ntawm electrochemical stratification ntawm boron.Nws ntseeg tau tias txoj hauv kev no feem ntau tuaj yeem siv los tshem tawm cov khoom tsis yog cov khoom siv rau hauv ob sab.Txawm li cas los xij, kev nkag siab zoo dua ntawm cov qauv thiab cov khoom ntawm cov txheej txheem qis qis yog xav tau, nrog rau kev tshawb fawb ntxiv.
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Txoj kev tshawb no tau txais kev txhawb nqa los ntawm National Science Center (Poland) raws li qhov nyiaj pab no.OPUS21 (2021/41/B/ST5/03279).
Nickel hlau mesh yog ib hom kev lag luam hlaudaim ntaubua los ntawm nickel hlau.Nws yog characterized los ntawm nws cov durability, hluav taws xob conductivity, thiab tsis kam mus corrosion thiab xeb.Vim nws cov khoom tshwj xeeb, nickel hlau mesh feem ntau yog siv rau hauv daim ntawv thov xws li pom, sieving, thiab kev sib cais hauv kev lag luam xws li aerospace, tshuaj, thiab kev ua zaub mov.Nws muaj nyob rau hauv ntau qhov ntau thiab tsawg mesh thiab hlau diameters kom haum rau ntau yam kev xav tau.